Research Catalog

Dry etching for VLSI

Title
Dry etching for VLSI / A.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader.
Author
Roosmalen, A. J. van.
Publication
New York : Plenum Press, c1991.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
TextRequest in advance JSF 92-422Offsite

Details

Additional Authors
  • Baggerman, J. A. G.
  • Brader, S. J. H.
Description
xvii, 237 p. : ill.; 26 cm.
Series Statement
Updates in applied physics and electrical technology
Subject
  • Semiconductors > Etching
  • Integrated circuits > Very large scale integration > Design and construction
  • Plasma etching
Bibliography (note)
  • Includes bibliographical references (p. 157-175) and index.
Call Number
JSF 92-422
ISBN
0306438356
LCCN
91007385
OCLC
  • 23142645
  • NYPG91-B27355
Author
Roosmalen, A. J. van.
Title
Dry etching for VLSI / A.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader.
Imprint
New York : Plenum Press, c1991.
Series
Updates in applied physics and electrical technology
Bibliography
Includes bibliographical references (p. 157-175) and index.
Added Author
Baggerman, J. A. G.
Brader, S. J. H.
Research Call Number
JSF 92-422
View in Legacy Catalog