Research Catalog

Title

Plasma processing of semiconductors / edited by P.F. Williams.

Publication

Boston : Kluwer, 1997.

Items in the Library & Off-site

Details

Additional Authors

• Williams, Peter Fairney, 1931-
• NATO Advanced Study Institute on "Plasma Processing of Semiconductors" (1996 : Château de Bonas, France.)

Description

x, 613 p. : ill.; 25 cm.

Series Statement

NATO ASI series. Series E., Applied sciences ; vol. 336

Uniform Title

NATO ASI series. Series E, Applied sciences ; no. 336.

Subject

• Plasma engineering > Congresses
• Semiconductors > Etching > Congresses
• Plasma etching > Industrial applications > Congresses
• Plasma chemistry > Industrial applications > Congresses

Note

• Papers from the NATO Advanced Study Institute on "Plasma Processing of Semiconductors" held at Château de Bonas, France, June 17-18, 1996.
• Includes index.

Bibliography (note)

• Includes bibliographical references and index.

Call Number

JSE 97-673

ISBN

0792345673 (acid-free paper)

LCCN

97016609

OCLC

36746516

Title

Plasma processing of semiconductors / edited by P.F. Williams.

Imprint

Boston : Kluwer, 1997.

Series

NATO ASI series. Series E., Applied sciences ; vol. 336

NATO ASI series. Series E, Applied sciences ; no. 336.

Bibliography

Includes bibliographical references and index.

Added Author

Williams, Peter Fairney, 1931-

NATO Advanced Study Institute on "Plasma Processing of Semiconductors" (1996 : Château de Bonas, France.)

Research Call Number

JSE 97-673