Research Catalog
Never leave well enough alone. [The personal record of an industrial designer]
- Title
- Never leave well enough alone. [The personal record of an industrial designer]
- Author
- Loewy, Raymond, 1893-1986.
- Publication
- New York, Simon and Schuster, 1951.
Items in the Library & Off-site
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1 Item
| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
Available - Can be used on site. Please visit New York Public Library - Schwarzman Building to submit a request in person. | Text | Use in library | MDW (Loewy, R. F. Never leave well enough alone) | Schwarzman Building - Art and Architecture Room 300 |
Details
- Description
- xii, 377 p. illus.; 19 cm.
- Subjects
- Call Number
- MDW (Loewy, R. F. Never leave well enough alone)
- LCCN
- 51002096
- OCLC
- 748448
- Author
- Loewy, Raymond, 1893-1986.
- Title
- Never leave well enough alone. [The personal record of an industrial designer]
- Imprint
- New York, Simon and Schuster, 1951.
- Research Call Number
- MDW (Loewy, R. F. Never leave well enough alone)