Research Catalog

Ultrathin SiO₂ and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

Title
Ultrathin SiO₂ and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. / editors, H.R. Huff ... [et al.].
Publication
Warrendale, PA : Materials Research Society, 1999.

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Details

Additional Authors
Huff, Howard R.
Description
xvii, 615 p. : ill.; 23 cm.
Series Statement
Material Research Society symposium proceedings ; v. 567
Uniform Title
Materials Research Society symposia proceedings ; v. 567.
Subject
  • Integrated circuits > Ultra large scale integration > Materials > Congresses
  • Silicon oxide films > Congresses
  • Gate array circuits > Materials > Congresses
  • Dielectrics > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
Call Number
JSE 00-1551
ISBN
1558994742
LCCN
99039825
OCLC
41944718
Title
Ultrathin SiO₂ and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. / editors, H.R. Huff ... [et al.].
Imprint
Warrendale, PA : Materials Research Society, 1999.
Series
Material Research Society symposium proceedings ; v. 567
Materials Research Society symposia proceedings ; v. 567.
Bibliography
Includes bibliographical references and index.
Added Author
Huff, Howard R.
Research Call Number
JSE 00-1551
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