Research Catalog

Advances in silicon carbide chemical vapor deposition (CVD) for semiconductor device fabrication

Title: Advances in silicon carbide chemical vapor deposition (CVD) for semiconductor device fabrication [microform] / J. Anthony Powell, Jeremy B. Petit, Lawrence G. Matus.
Author: Powell, J. Anthony.
Publication: [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1991]

Details

Additional Authors

Description

1 v.

Series Statement

NASA technical memorandum ; 104410

Subject

Note

Distributed to depository libraries in microfiche.

Reproduction (note)

Microfiche.

Call Number

READEX Microfiche NAS 1.15:104410

OCLC

marcive25125969

Author

Powell, J. Anthony.

Title

Advances in silicon carbide chemical vapor deposition (CVD) for semiconductor device fabrication [microform] / J. Anthony Powell, Jeremy B. Petit, Lawrence G. Matus.

Imprint

[Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1991]

Series

NASA technical memorandum ; 104410

Reproduction

Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration], 1991. 1 microfiche.

Added Author

Petit, Jeremy B.

Matus, Lawrence G.

United States. National Aeronautics and Space Administration.

Gpo Item No.

830-D (MF)

Sudoc No.

NAS 1.15:104410

Research Call Number

READEX Microfiche NAS 1.15:104410

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