Research Catalog

Method for anisotropic etching in the manufacture of semiconductor devices

Title
Method for anisotropic etching in the manufacture of semiconductor devices [microform] / inventors, Steven Koontz and Jon Cross.
Publication
[Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1991]

Details

Additional Authors
  • Koontz, Steven.
  • Cross, Jon.
  • United States. National Aeronautics and Space Administration.
Description
1 v.
Series Statement
NASA case ; no. MSC-21631-1
Uniform Title
NASA case ; MSC-21631-1.
Subject
  • Anisotropy
  • Etching
  • Microelectronics
  • Oxygen atoms
  • Semiconductor devices
Note
  • Distributed to depository libraries in microfiche.
  • Shipping list no.: 92-0705-M.
Reproduction (note)
  • Microfiche.
Call Number
READEX Microfiche NAS 1.71:MSC-21631-1
OCLC
marcive32943412
Title
Method for anisotropic etching in the manufacture of semiconductor devices [microform] / inventors, Steven Koontz and Jon Cross.
Imprint
[Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1991]
Series
NASA case ; no. MSC-21631-1
NASA case ; MSC-21631-1.
Reproduction
Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1991] 1 microfiche.
Added Author
Koontz, Steven.
Cross, Jon.
United States. National Aeronautics and Space Administration.
Gpo Item No.
0830-J-10 (MF)
Sudoc No.
NAS 1.71:MSC-21631-1
Research Call Number
READEX Microfiche NAS 1.71:MSC-21631-1
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