Research Catalog

Dopant incorporation efficiency in CVD silicon carbide epilayers

Title
Dopant incorporation efficiency in CVD silicon carbide epilayers [microform] / D.J. Larkin.
Author
Larkin, D. J.
Publication
[Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1996]

Details

Additional Authors
United States. National Aeronautics and Space Administration.
Description
1 v.
Series Statement
NASA-TM ; 112756
Uniform Title
NASA technical memorandum ; 112756.
Subject
  • Vapor deposition
  • Silicon carbides
  • Epitaxy
  • Additives
Note
  • Shipping list no.: 98-0613-M.
Reproduction (note)
  • Microfiche.
Call Number
READEX Microfiche NAS 1.15:112756
OCLC
marcive42996198
Author
Larkin, D. J.
Title
Dopant incorporation efficiency in CVD silicon carbide epilayers [microform] / D.J. Larkin.
Imprint
[Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1996]
Series
NASA-TM ; 112756
NASA technical memorandum ; 112756.
Reproduction
Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1997] 1 microfiche.
Added Author
United States. National Aeronautics and Space Administration.
Gpo Item No.
0830-D (MF)
Sudoc No.
NAS 1.15:112756
Research Call Number
READEX Microfiche NAS 1.15:112756
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