Research Catalog

Title

Interferometric metrology of photomask blanks [microform] : approaches using 633 nm wavelength / C.J. Evans ... [et al.].

Publication

Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2002]

Details

Additional Authors

• Evans, C. J.
• National Institute of Standards and Technology (U.S.)

Description

11 p. : ill.; 28 cm.

Summary

"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.

Series Statement

NISTIR ; 6701

Subject

• Interferometry
• Photolithography
• Optical measurements
• Optical instruments > Testing

Note

• "December 21, 2000."
• Shipping list no.: 2003-0057-M.

Bibliography (note)

• Includes bibliographical references (p. 10-11).

Reproduction (note)

• Microfiche.

Call Number

GPO Microfiche C 13.58:6701

OCLC

marcive51616296

Title

Interferometric metrology of photomask blanks [microform] : approaches using 633 nm wavelength / C.J. Evans ... [et al.].

Imprint

Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2002]

Series

NISTIR ; 6701

Bibliography

Includes bibliographical references (p. 10-11).

Reproduction

Microfiche. [Washington, D.C.] : Supt. of Docs., U.S. G.P.O., 2002. 1 microfiche : negative.

Added Author

Evans, C. J.

National Institute of Standards and Technology (U.S.)

Gpo Item No.

0247-D (MF)

Sudoc No.

C 13.58:6701

Research Call Number

GPO Microfiche C 13.58:6701