- Additional Authors
- Series Statement
- Conference paper ; NREL/CP-520-33929
- Subject
- Note
- Title from title screen (viewed on May 18, 2004).
- System Details (note)
- Mode of access: Internet from the NREL web site. Address as of 5/18/04: http://www.nrel.gov/docs/fy03osti/33929.pdf; current access available via PURL.
- Call Number
- GPO Internet E 9.17:NREL/CP-520-33929
- OCLC
- marcive55204116
- Title
Influence of substrate temperature and hydrogen dilution ration on the properties of nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition : preprint / H.R. Moutinho ... [and others].
- Publisher
Golden, Colo. : National Renewable Energy Laboratory, [2003]
- Type of Content
text
- Type of Medium
computer
- Type of Carrier
online resource
- Series
Conference paper ; NREL/CP-520-33929
- System Details
Mode of access: Internet from the NREL web site. Address as of 5/18/04: http://www.nrel.gov/docs/fy03osti/33929.pdf; current access available via PURL.
- Connect to:
- Added Author
Moutinho, Helio R.
National Renewable Energy Laboratory (U.S.)
- Other Form:
Influence of substrate temperature and hydrogen dilution ration on the properties of nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition 6 p. (OCoLC)53114977
- Gpo Item No.
0430-P-04 (online)
- Sudoc No.
E 9.17:NREL/CP-520-33929