Research Catalog

Photomask fabrication technology

Title
Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
Author
Eynon, Benjamin G.
Publication
New York : McGraw-Hill, c2005.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
TextRequest in advance JSE 05-1224Offsite

Details

Additional Authors
Wu, Banqiu.
Description
xi, 571 p. : ill.; 24 cm.
Series Statement
McGraw-Hill electronic engineering
Uniform Title
McGraw-Hill professional engineering. Electronic engineering.
Subject
  • Integrated circuits > Masks
  • Masks (Electronics)
  • Microlithography
Bibliography (note)
  • Includes bibliographical references and index.
Call Number
JSE 05-1224
ISBN
0071445633 (alk. paper)
LCCN
2005047886
OCLC
  • 57638600
  • vendorOCM57638600
Author
Eynon, Benjamin G.
Title
Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
Imprint
New York : McGraw-Hill, c2005.
Series
McGraw-Hill electronic engineering
McGraw-Hill professional engineering. Electronic engineering.
Bibliography
Includes bibliographical references and index.
Added Author
Wu, Banqiu.
Research Call Number
JSE 05-1224
View in Legacy Catalog