Research Catalog
Photomask fabrication technology
- Title
- Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
- Author
- Eynon, Benjamin G.
- Publication
- New York : McGraw-Hill, c2005.
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Details
- Additional Authors
- Wu, Banqiu.
- Description
- xi, 571 p. : ill.; 24 cm.
- Series Statement
- McGraw-Hill electronic engineering
- Uniform Title
- McGraw-Hill professional engineering. Electronic engineering.
- Subject
- Bibliography (note)
- Includes bibliographical references and index.
- Call Number
- JSE 05-1224
- ISBN
- 0071445633 (alk. paper)
- LCCN
- 2005047886
- OCLC
- 57638600
- vendorOCM57638600
- Author
- Eynon, Benjamin G.
- Title
- Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
- Imprint
- New York : McGraw-Hill, c2005.
- Series
- McGraw-Hill electronic engineeringMcGraw-Hill professional engineering. Electronic engineering.
- Bibliography
- Includes bibliographical references and index.
- Added Author
- Wu, Banqiu.
- Research Call Number
- JSE 05-1224