Research Catalog

Correlation between plasma variables and the deposition process of Si films from chlorosilanes in low pressure rf plamas of argon and hydrogen

Title
Correlation between plasma variables and the deposition process of Si films from chlorosilanes in low pressure rf plamas of argon and hydrogen [microform] / R. Avni, ... [et al.].
Publication
[Washington, D.C. : National Aeronautics and Space Administration, 1984]

Details

Additional Authors
  • Avni, Reuven.
  • United States. National Aeronautics and Space Administration.
Description
1 v.
Series Statement
NASA technical memorandum ; 83603
Subject
  • Chlorosilanes
  • Argon plasmas
  • Hydrogen plasmas
  • Electrostatics
  • Plasma heating
  • Precipitation (chemistry)
  • Radio frequencies
Reproduction (note)
  • Microfiche.
Call Number
GPO Microfiche NAS 1.15:83603
OCLC
marcive239085430
Title
Correlation between plasma variables and the deposition process of Si films from chlorosilanes in low pressure rf plamas of argon and hydrogen [microform] / R. Avni, ... [et al.].
Imprint
[Washington, D.C. : National Aeronautics and Space Administration, 1984]
Series
NASA technical memorandum ; 83603
Reproduction
Microfiche. [Washington, D.C. : National Aeronautics and Space Administration], 1984. 1 microfiche.
Added Author
Avni, Reuven.
United States. National Aeronautics and Space Administration.
Gpo Item No.
0830-D (MF)
Sudoc No.
NAS 1.15:83603
Research Call Number
GPO Microfiche NAS 1.15:83603
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