- Additional Authors
- Description
- 1 online resource (21 unnumbered pages) : illustrations.
- Series Statement
- NISTIR ; 7234
- Uniform Title
- NISTIR ; 7234.
- Subject
- Note
- "February 2006."
- Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
- Title from page [1], viewed March 7, 2007.
- Bibliography (note)
- Includes bibliographical references.
- Call Number
- GPO Internet C 13.58:7234
- LCCN
- GOVPUB-C13-752d1bed8ba5e339a5dbbbe7614cc375
- OCLC
- marcive123128229
- Title
Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects / A. Emre Yarimbiyik [and others].
- Publisher
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology, [2006]
- Type of Content
text
- Type of Medium
computer
- Type of Carrier
online resource
- Series
NISTIR ; 7234
NISTIR ; 7234.
- Bibliography
Includes bibliographical references.
- Connect to:
- Added Author
Allen, Ricky.
Blackburn, David L.
Schafft, Harry A.
Yarimbiyik, A. Emre.
Zaghloul, Mona E.
National Institute of Standards and Technology (U.S.). Semiconductor Electronics Division.
- Other Standard Identifier
GOVPUB-C13-752d1bed8ba5e339a5dbbbe7614cc375
- Gpo Item No.
0247-D (online)
- Sudoc No.
C 13.58:7234