- Additional Authors
- U.S. Army Research Laboratory, issuing body.
- Description
- 1 online resource (vi, 16 pages) : color illustrations.
- Series Statement
- ARL-TR ; 6128
- Uniform Title
- ARL-TR (Aberdeen Proving Ground, Md.) ; 6128.
- Subject
- Note
- Title from title screen (viewed on Jan. 17, 2013).
- "September 2012."
- Bibliography (note)
- Includes bibliographical references (pages 11-12).
- Type of Report (note)
- Call Number
- GPO Internet D 101.133:6128
- OCLC
- marcive824557063
- Author
Semendy, Fred, author.
- Title
Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications / Fred Semendy [and three others].
- Publisher
Adelphi, MD : Army Research Laboratory, 2012.
- Type of Content
text
- Type of Medium
computer
- Type of Carrier
online resource
- Series
ARL-TR ; 6128
ARL-TR (Aberdeen Proving Ground, Md.) ; 6128.
- Type Of Report
Final.
- Bibliography
Includes bibliographical references (pages 11-12).
- Connect to:
- Added Author
U.S. Army Research Laboratory, issuing body.
- Other Form:
Print version: Semendy, Fred. Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications (OCoLC)824560306
- Gpo Item No.
0324-A-01 (online)
- Sudoc No.
D 101.133:6128