Research Catalog
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
- Title
- Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Publication
- Bellingham, Wash., USA : SPIE, [1991], ©1991.
Items in the Library & Off-site
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1 Item
| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
| Text | Request in advance | TK7874 .E4357 1991g | Off-site |
Holdings
Details
- Additional Authors
- Description
- x, 340 pages : illustrations; 28 cm.
- Series Statement
- SPIE proceedings series, 0277-786X ; vol. 1465
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1465.
- Subject
- Note
- "Conference 1465 ... was part of a two-conference program on Lithography Engineering, held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii.
- Bibliography (note)
- Includes bibliographical references and index.
- ISBN
- 0819405647
- LCCN
- 91061058
- OCLC
- 24449213
- ocm24449213
- Owning Institutions
- Columbia University Libraries