Research Catalog

LPCVD silicon nitride and oxynitride films : material and applications in integrated circuit technology

Title
LPCVD silicon nitride and oxynitride films : material and applications in integrated circuit technology / F.H.P.M. Habraken, (Ed.).
Publication
Berlin ; New York : Springer-Verlag, 1991.

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Details

Additional Authors
  • Habraken, F. H. P. M.
  • European Strategic Programme of Research and Development in Information Technology.
Description
x, 159 pages : illustrations; 25 cm.
Series Statement
Research reports ESPRIT. Project 369 ; vol. 1
Uniform Title
Research reports ESPRIT. Project 369 ; v. 1.
Subjects
Bibliography (note)
  • Includes bibliographical references.
ISBN
  • 3540539549 (Berlin)
  • 0387539549 (New York)
OCLC
  • 24351732
  • ocm24351732
Owning Institutions
Columbia University Libraries