Research Catalog

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California

Title
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California / Martin Peckerar,chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Publication
Bellingham, Wash., USA : SPIE, [1992], ©1992.

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Details

Additional Authors
  • Peckerar, Martin Charles, 1946-
  • Society of Photo-optical Instrumentation Engineers.
Description
x, 488 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 1671
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 1671.
Subject
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Ion beam lithography > Congresses
Bibliography (note)
  • Includes bibliographical references and author index.
ISBN
0819408263
LCCN
92060181
OCLC
ocm26466509
Owning Institutions
Columbia University Libraries