Research Catalog

Single chamber processing : proceedings of the joint session on single chamber processing : requirements and challenges of the 1992 E-MRS Spring Meeting Conference, Strasbourg, France, June 2-5, 1992

Title
Single chamber processing : proceedings of the joint session on single chamber processing : requirements and challenges of the 1992 E-MRS Spring Meeting Conference, Strasbourg, France, June 2-5, 1992 / edited by Yves I. Nissim, Avishay Katz.
Author
European Materials Research Society. Meeting (1992 : Strasbourg, France)
Publication
Amsterdam ; New York : North-Holland, 1993.

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Details

Additional Authors
  • Nissim, Yves I., 1953-
  • Katz, Avishay.
Description
x, 162 pages : illustrations; 29 cm.
Series Statement
European Materials Research Society symposia proceedings ; v. 37
Uniform Title
European Materials Research Society symposia proceedings ; v. 37.
Subjects
Bibliography (note)
  • Includes bibliographical references.
Contents
  • Preface and Introduction / Y. I. Nissim and A. Katz -- Implementation of Gate Stack Integrated Process through a Cluster Tool Concept / A. Kermani, C. Galewski and A. Gat -- Integrated Processing Tools for Electronic Materials / A. K. Sinha -- Single Wafer Integrated Processes by RT-LPMOCVD Modules - Application in the Manufacturing of InP-Based Laser Devices / A. Katz and S. J. Pearton -- Thin Dielectric Films Integrated Manufacturing on III-V Materials: Plasma Cleaning and Light Assisted Chemical Vapour Deposition / O. Dulac, Y. I. Nissim and B. Sermage -- In-Process Control of Silicide Formation during Rapid Thermal Processing / J.-M. Dilhac, C. Canibal, N. Nolhier, P. B. Moynagh, C. P. Chew and P. J. Rosser -- Poly-Emitter Fabrication in a Single Vertical Reactor Clustered with HF Vapor Etching / M. Hendriks, C. J. Werkhoven, F. Huussen and E. H. A. Granneman.
  • Low Temperature In-Situ Cleaning of Silicon Wafers with an Ultra High Vacuum Compatible Plasma Source / J. Ramm, E. Beck, A. Zuger, A. Dommann and R. E. Pixley -- Radial Control of the Physical Properties of RT-LPCVD Polysilicon Films Deposited in a Cylindrical Cold Wall Reactor / B. Semmache, S. Krieger-Kaddour, N. Gonon, M. Lemiti, A. Laugier and D. Barbier -- In-Situ Process Integration of Polysilicon Emitter Stacks by Rapid Thermal Multi-Processing / I. Barsony, R. Remmers and J. G. E. Klappe -- In-Situ Ellipsometry for Real-Time Feedback Control of Oxidation Furnaces / C. Schneider, R. Berger, L. Pfizner and H. Ryssel -- Critical Issues for Single-Chamber Manufacturing: The Role of Laser Technology / D. J. Ehrlich -- Fabrication and Characterization of Selectively Grown Si[subscript 1-x]Ge[subscript x]/Sip[superscript +]/N Heterojunctions Using Pulsed Laser Induced Epitaxy and Gas Immersion Laser Doping / K.-J. Kramer, S. Talwar, E. Ishida, K. H. Weiner and T. W. Sigmon.
  • UV Assisted Oxydation of SiGe Strained Layers / V. Craciun, A. H. Reader, W. Kersten, J. Timmers, D. J. Gravesteijn and I. W. Boyd -- A Novel VUV Photochemical Deposition Apparatus / C. Manfredotti, F. Fizzotti, M. Boero and G. Piatti.
ISBN
0444899154 (alk. paper)
LCCN
92042556
OCLC
  • 27267723
  • ocm27267723
Owning Institutions
Columbia University Libraries