Research Catalog
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
- Title
- Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Publication
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
Items in the Library & Off-site
Filter by
1 Item
| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
Not available - Please for assistance. | Text | Request in advance | TK7874 .E4834 1994g | Off-site |
Holdings
Details
- Additional Authors
- Description
- vii, 420 pages : illustrations; 28 cm.
- Series Statement
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 2194
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2194.
- Subjects
- Bibliography (note)
- Includes bibliographical references and index.
- ISBN
- 0819414891
- LCCN
- 94065789
- OCLC
- ocm30614005
- Owning Institutions
- Columbia University Libraries