Research Catalog

Title

Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.

Author

Tandon, U. S., 1952-

Publication

New York : J. Wiley, 1993.

Items in the Library & Off-site

Holdings

Details

Additional Authors

Khokle, W. S.

Description

xii, 183 pages : illustrations (some color); 25 cm

Summary

• Economic success of multimegabit memories has upheld the evolution of technology for creating submicron structures. These structures also constitute neural networks, nanomachines, smart sensors, quantum devices and so on. Patterning of Material Layers in Submicron Region offers, in a single ensemble, state-of-the-art information on various lithographic and delineation techniques along with their applications.
• It invokes the interests of the reader into the wonderland of nanominiaturization for industrial, biological and fundamental applications. Its contents portray the advent and relevance of submicron structures and proffer a perception of materials, modules and schemes for preparing them.
• .
• Patterning of Material Layers in Submicron Region puts forth a coherent and comprehensive treatise of three submicron patterning technologies viz. electron beam, ion beam and X-ray lithography. These technologies are undergoing rapid individual developments and are vying with each other to become the chief writing tool of multitrillion dollar microelectronic industry.
• This book is endowed with quantitative features of the operational ingredients such as sources, resists, masks, writing/aligning/scanning techniques and commercial/captive systems. It is profusely illustrated with layout diagrams, flowcharts, analyses and SEM pictures of novel results to ensure lucidity. The book also presents various recent developments such as X-ray mask preparation, plasma developing resists and compact synchrotron with statistical details.
• . Implications, scope and trend of these technologies are demonstrated through significant results followed by brief futuristic projections of the activities and devices. The book aims to meet the requirements of modernizing postgraduate sylabi and enhancing the capabilities of R&D engineers as well as capital equipment manufacturer. It also covers useful material for technology optimiser and device & systems planner.

Subject

• Integrated circuits > Masks
• Ion beam lithography
• Lithography, Electron beam
• X-ray lithography

Bibliography (note)

• Includes bibliographical references and index.

Contents

I. Submicron Patterning: State of the Art and Vistas. 1. The Amelioration. 2. Prospective Avenues -- II. Electron Beam Lithography. 2. Electron Beam Sources. 3. Resists. 4. Technology. 5. EBL Applications -- 6. Conclusions and Trajections -- III. Ion Beam Lithography. 2. I-Beam Resists. 3. Exposure Techniques. 4. Focused Ion Beam Lithography (FIBL). 5. Parallel Processing with Ions. 6. Problems and Limitations in Ion Beam Lithography. 7. Applications of Ion Beam Lithography -- 8. Conclusions and Prenotations -- IV. X-Ray Lithography. 2. Principle. 3. X-Ray Sources. 4. Enlarging the Exposure Field. 5. Beamline for Synchrotron Radiation. 6. X-ray Masks. 7. X-Ray Resists. 8. Alignment Schemes. 9. X-Ray Lithography Systems. 10. Applications of X-Ray Lithography -- 11. Conclusion and Directions -- V. Nanotechnology: Present Day Scenario. 1. International Status. 2. Projections.

ISBN

• 0470220635 (J. Wiley)
• 8122405614 (Wiley Eastern)

LCCN

92036072

OCLC

ocm27036323

Owning Institutions

Columbia University Libraries