Research Catalog

The chemistry of metal CVD

Title
The chemistry of metal CVD / edited by Toivo T. Kodas and Mark J. Hampden-Smith.
Publication
Weinheim ; New York : VCH, 1994.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
Request for On-site UseRequest Scan
How do I pick up this item and when will it be ready?
TextRequest in advance TK7867 .C46 1994Off-site

Holdings

Details

Additional Authors
  • Kodas, Toivo T. (Toivo Tarmo), 1958-
  • Hampden-Smith, Mark J.
Description
xxiv, 530 pages : illustrations; 25 cm
Subjects
Bibliography (note)
  • Includes bibliographical references and index.
Contents
1. Introduction -- 2. Chemical Vapor Deposition of Aluminum -- 3. Chemical Vapor Deposition of Tungsten -- 4. Chemical Vapor Deposition of Copper from Copper(II) Precursors -- 5. Chemical Vapor Deposition of Copper from Copper(I) Precursors -- 6. Chemical Vapor Deposition of Gold and Silver -- 7. Chemical Vapor Deposition of Platinum, Palladium and Nickel -- 8. Chemical Vapor Deposition of Assorted Metals -- 9. Overview of Metal CVD -- Appendix 1: Examples of Chemical Nomenclature.
ISBN
  • 1560818131 :
  • 3527290710
LCCN
94022847
OCLC
  • 30893172
  • ocm30893172
Owning Institutions
Columbia University Libraries