Research Catalog
Principles of plasma discharges and materials processing
- Title
- Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.
- Author
- Lieberman, M. A. (Michael A.)
- Publication
- New York : Wiley, [1994], ©1994.
Items in the Library & Off-site
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1 Item
Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | QC718.5.D9 L54 1994 | Off-site |
Holdings
Details
- Additional Authors
- Lichtenberg, Allan J.
- Description
- xxvi, 572 pages : illustrations; 25 cm
- Summary
- Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits.
- With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
- Subject
- Note
- "A Wiley-Interscience publication."
- Bibliography (note)
- Includes bibliographical references (p. 559-564) and index.
- Contents
- 1. Introduction -- 2. Basic Plasma Equations and Equilibrium -- 3. Atomic Collisions -- 4. Plasma Dynamics -- 5. Diffusion and Transport -- 6. DC Sheaths -- 7. Chemical Reactions and Equilibrium -- 8. Molecular Collisions -- 9. Chemical Kinetics and Surface Processes -- 10. Particle and Energy Balance in Discharges -- 11. Capacitive Discharges -- 12. Inductive Discharges -- 13. Wave-Heated Discharges -- 14. DC Discharges -- 15. Etching -- 16. Deposition and Implantation -- A: Collision Dynamics -- B: The Collision Integral and Kinetic Theory -- C: Stochastic Heating in an Inductive Discharge.
- ISBN
- 0471005770
- LCCN
- 94028954
- OCLC
- 30896011
- ocm30896011
- Owning Institutions
- Columbia University Libraries