Research Catalog
Chemical vapor deposition : thermal and plasma deposition of electronic materials
- Title
- Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram.
- Author
- Sivaram, S.
- Publication
- New York : Van Nostrand Reinhold, [1995], ©1995.
Items in the Library & Off-site
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1 Item
| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
Not available - Please for assistance. | Text | Request in advance | TK7836 .S54 1995 | Off-site |
Holdings
Details
- Description
- xii, 292 pages : illustrations; 24 cm
- Subjects
- Bibliography (note)
- Includes bibliographical references and index.
- Contents
- 1. Introduction -- 2. Thin Film Phenomena -- 3. Manufacturability -- 4. Chemical Equilibrium and Kinetics -- 5. Reactor Design for Thermal CVD -- 6. Fundamentals of Plasma Chemistry -- 7. Processing Plasmas and Reactors -- 8. CVD of Conductors -- 9. CVD of Dielectrics -- 10. CVD of Semiconductors -- 11. Emerging CVD Techniques -- Appendix - Vacuum Techniques for CVD.
- ISBN
- 0442010796
- LCCN
- 94039696
- OCLC
- 31330483
- ocm31330483
- Owning Institutions
- Columbia University Libraries