Research Catalog

Title

Microlithography amd metrology in micromachining : 23-24 October, 1995, Austin, Texas / Michael T. Postek, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.

Publication

Bellingham, Wash., USA : SPIE, [1995], ©1995.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Postek, Michael T.
• Society of Photo-optical Instrumentation Engineers.

Description

ix, 246 pages : illustrations; 28 cm.

Series Statement

Proceedings / SPIE--the International Society for Optical Engineering ; v. 2640

Uniform Title

Proceedings of SPIE--the International Society for Optical Engineering ; v. 2640.

Subject

• Micromechanics > Congresses
• Microlithography > Congresses

Bibliography (note)

• Includes bibliographic references and author index.

Contents

• Projection displays and MEMS: timely convergence for a bright future / L. J. Hornbeck -- Recent trends in silicon micromachining technology / H. Jerman -- Overview of the miniaturization technologies / R. O. Warrington -- Generic technology, measurement, and standards issues in micromachining and microfabrication / D. A. Swyt -- Microanalysis to nanoanalysis: analytical techniques for chemical characterization of micrometer- to nanometer-scale structures / D. E. Newbury -- X-ray microlithography exposure system for high aspect ratio micromachining / Y. Vladimirsky, K. J. Morris, J. M. Klopf, O. Vladimirsky and V. Saile -- Micromechanical cantilevers and scanning probe microscopes / S. A. Miller, Y. Xu and N. C. MacDonald -- Optical methods for characterization of MEMS device motion / P. R. Nelson, P. B. Chu and K. S. J. Pister -- Microfabrication of channel electron multipliers / G. W. Tasker, S. T. Bentley, S. M. Shank, R. J. Soave and A. M. Then --
• E-beam lithography: a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles / E.-B. Kley and B. Schnabel -- 1/N Feynman machines as a path to ultraminiaturization / E. C. Teague -- Challenge of automotive sensors / J. M. Giachino and T. J. Miree -- FIB 601 Focused ion beam fabrication of micron-sized apertures for the NASA AXAF x-ray telescope prelaunch calibration / E. Y. Tsiang, E. M. Kellogg and D. Porterfield -- Very high aspect ratio wafer-free silicon micromechanical structures / A. Jazairy and N. C. MacDonald -- Process optimization of single-coat positive photoresist for thick film applications / A. E. Kozlowski -- Design and fabrication of micromachined electron guns (MEGs) using a multiple-level planar tungsten process / W. Hofmann, L.-Y. Chen and N. C. MacDonald -- Application of the prototype NIST SRM 2090A SEM magnification standard in a manufacturing environment / B. L. Newell, M. T. Postek and J. P. van der Ziel --
• Fabrication and testing of microchannel heat exchangers / J. M. Cuta, W. D. Bennett, C. E. McDonald and T. S. Ravigururajan -- Rapid fabrication of molds by mechanical micromilling: process development / C. Friedrich and B. Kikkeri -- Integrated optical bench for a CO[subscript 2] gas sensor / Y. M. Desta, M. C. Murphy, M. Madou and J. W. Hines -- Low-temperature process for very high aspect ratio silicon microstructures using SOG etch mask / X. T. Huang, L.-Y. Chen and N. C. MacDonald -- Thin metal film thermal microsensors / Y. Vladimirsky, N. Rau, H. Manohara, K. J. Morris, J. M. Klopf, G. Calderon and O. Vladimirsky -- Three-dimensional functional integration in silicon using confined selective epitaxial growth / M. Bartek, P. T. J. Gennissen and R. F. Wolffenbuttel -- Fabrication of miniaturized electrostatic deflectors using LIGA / K. H. Jackson, C. Khan Malek, L. P. Murray, W. D. Bonivert, J. M. Hruby, J. T. Hachmann and T. H. P. Chang --
• Fabricating subcollimating grids for an x-ray solar imaging spectrometer using LIGA techniques / R. A. Brennen, M. H. Hecht, D. V. Wiberg, S. J. Manion, W. D. Bonivert, J. M. Hruby, M. L. Scholz, T. D. Stowe, T. W. Kenny, K. H. Jackson and C. Khan Malek -- Fine pitch grids for an x-ray solar imaging spectrometer fabricated by optical lithography and XeF[subscript 2] etching / R. A. Brennen, M. H. Hecht, D. V. Wiberg, S. J. Manion, W. D. Bonivert, J. M. Hruby, K. S. J. Pister and E. Kruglick -- Effects of doping on the dynamic mechanical response of semiconductor cantilevers to electrostatic forces / A. K. Henning.

ISBN

0819420069

LCCN

95070375

OCLC

ocm33310898

Owning Institutions

Columbia University Libraries