Research Catalog

Process, equipment, and materials control in integrated circuit manufacturing : 25-26 October 1995, Austin, Texas

Title
Process, equipment, and materials control in integrated circuit manufacturing : 25-26 October 1995, Austin, Texas / Anant G. Sabnis, Ivo J. Raaijmakers, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Publication
Bellingham, Wash., USA : SPIE, [1995], ©1995.

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Additional Authors
  • Sabnis, Anant G.
  • Raaijmakers, Ivo J.
  • Society of Photo-optical Instrumentation Engineers.
Description
vii, 238 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 2637
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2637.
Subject
  • Integrated circuits > Design and construction > Congresses
  • Plasma etching > Congresses
  • Metallizing > Congresses
  • Dielectric films > Congresses
Bibliography (note)
  • Includes bibliographic references and author index.
Contents
  • Manufacturing challenges for sub-half-micron technologies / F.-T. Liou -- In-situ particle monitoring: today's technology drivers / P. Borden, M. Elzingre and D. Aqui -- Multiresolution pattern detector networks for controlling plasma etch reactors / R. L. Allen, R. Moore and M. Whelan -- Neural manufacturing: a novel concept for processing modeling, monitoring, and control / C. Y. Fu, L. Petrich and B. Law -- System integration for laser restructuring / W. A. Moreno, N. Saini and O. Acon -- Applications of laser scanning systems to deposited dielectrics / C. T. Larson -- Elimination of monitor wafers in metal film process control / W. H. Johnson, D. Hobbs, R. Jones and G. Pors -- Effect of sputtering target crystallographic orientation on step coverage and collimation efficiency / R. S. Bailey and N. C. Hill -- Materials delivery challenges in ULSI processing / J. F. Loan, L. A. Sullivan and J. J. Sullivan --
  • In-situ process monitoring in metal deposition processes / S. Kobayashi, E. Nishitani, H. Shimamura, A. Yajima, S. Kishimoto, Y. Yoneoka, H. Uchida and N. Morioka -- Sensing technologies for semiconductor process applications / A. Iturralde -- In-situ wafer curvature measurements during rapid thermal annealing of Si(100) wafers / J. F. Jongste, T. G. M. Oosterlaken, G. C. J. Bart, G. C. A. M. Janssen and S. Radelaar -- Control of CVD precursor purity for integrated circuit manufacture / D. A. Roberts, H. J. Graf and M. J. Halberstadt -- Digital tester-based measurement methodology for process control in multilevel metallization systems / C. Hess and L. H. Weiland -- SCA and SPV in line monitoring / K. Barla, D. Levy, A. Fleury, J. P. Reynard and L. Kwakman -- On-line exhaust gas analytics during plasma cleaning of PECVD facilities / A. E. Guber and U. Kohler --
  • Automation in semiconductor production minienvironments, flexibility and information flow / R. Dudde, P. Staudt-Fischbach and O. Herzog -- Relationships between process fundamentals, facility design, and production control of semiconductor manufacturing systems / S. Chen, R. C. Hase, K. Mordaunt, R. M. Uzsoy and C. G. Takoudis -- Contamination control for ultrapure chemicals from microelectronics fabrication / D. G. Ulieru -- Resistor, silicon dioxide, and nitrite films ion etching process: in-situ monitoring using photoemission testing / A. Kunitzin, Y. Dekhtyar and V. Noskov -- Spectral ellipsometry on patterned wafers / D. W. Mills, R. L. Allen and W. M. Duncan -- Evaluation of ULPA/prefilter media for the reduction of airborne boron contamination / J. Squatrito, R. Nanez, Jr. and D. Keeton -- Development of cost of ownership modeling at a semiconductor production facility / R. Nanez, Jr. and A. Iturralde --
  • Self-learning intellectual system of expert diagnostics of technological malfunctions in ULSI manufacturing / P. A. Arutyunov and M. G. Kuznetsov -- Method of multilayer semiconductor structures cross section preparation for transmission electron microscopy / V. Y. Karasyov, A. V. Skornyakov and M. G. Kuznetsov.
ISBN
0819420034
LCCN
95070380
OCLC
ocm33331897
Owning Institutions
Columbia University Libraries