Research Catalog
Plasma deposition of amorphous silicon-based materials
- Title
- Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.
- Publication
- San Diego, CA : Academic Press, 1995.
Items in the Library & Off-site
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1 Item
| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
| Text | Request in advance | TK7871.99.A45 P55 1995 | Off-site |
Holdings
Details
- Additional Authors
- Description
- ix, 324 pages : illustrations; 24 cm.
- Series Statement
- Plasma--materials interactions
- Uniform Title
- Plasma--materials interactions.
- Subjects
- Bibliography (note)
- Includes bibliographical references and index.
- Contents
- 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects / Giovanni Bruno, Pio Capezzuto and Grazia Cicala -- 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes / Guy Turban, Bernard Drevillon, Dimitri S. Mataras and Dimitri E. Rapakoulias -- 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys / C. M. Fortmann -- 4. Reactor Design for a-Si:H Deposition / Jerome Perrin -- 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma-Enhanced Chemical Vapor Deposition (PECVD) Technique / Arun Madan -- 6. Amorphous-Silicon-Based Devices / Yoshihiro Hamakawa, Wen Ma and Hiroaki Okamoto.
- ISBN
- 012137940X
- LCCN
- 95012433
- OCLC
- 32311752
- ocm32311752
- Owning Institutions
- Columbia University Libraries