Research Catalog

Plasma deposition of amorphous silicon-based materials

Title
Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.
Publication
San Diego, CA : Academic Press, 1995.

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Additional Authors
  • Bruno, Giovanni.
  • Capezzuto, Pio.
  • Madan, A. (Arun)
Description
ix, 324 pages : illustrations; 24 cm.
Series Statement
Plasma--materials interactions
Uniform Title
Plasma--materials interactions.
Subject
  • Amorphous semiconductors > Design and construction
  • Silicon alloys
  • Plasma-enhanced chemical vapor deposition
Bibliography (note)
  • Includes bibliographical references and index.
Contents
1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects / Giovanni Bruno, Pio Capezzuto and Grazia Cicala -- 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes / Guy Turban, Bernard Drevillon, Dimitri S. Mataras and Dimitri E. Rapakoulias -- 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys / C. M. Fortmann -- 4. Reactor Design for a-Si:H Deposition / Jerome Perrin -- 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma-Enhanced Chemical Vapor Deposition (PECVD) Technique / Arun Madan -- 6. Amorphous-Silicon-Based Devices / Yoshihiro Hamakawa, Wen Ma and Hiroaki Okamoto.
ISBN
012137940X
LCCN
95012433
OCLC
  • 32311752
  • ocm32311752
Owning Institutions
Columbia University Libraries