Research Catalog

Title

Materials--fabrication and patterning at the nanoscale : symposium held April 19-20, 1995, San Francisco, California, U.S.A. / editors, F. Cerrina, C. Marrian.

Publication

Pittsburgh, Pa. : Materials Research Society, [1995], ©1995.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Cerrina, F. (Franco)
• Marrian, Christie R. K.

Description

ix, 202 pages : illustrations; 24 cm.

Series Statement

Materials Research Society symposium proceedings, 0272-9172 ; v. 380

Uniform Title

Materials Research Society symposia proceedings ; v. 380.

Alternative Title

Fabrication and patterning at the nanoscale

Subject

• Nanostructured materials > Congresses
• Nanotechnology > Congresses

Bibliography (note)

• Includes bibliographical references and indexes.

Contents

• Materials Research Society Symposium Proceedings -- Molecular Beam Epitaxy of Si/ZnS/Si(100) Heterostructures for Silicon-Based Quantum Devices / Xiaochuan Zhou, Feng Li, Gregory F. Spencer and Wiley P. Kirk -- Nanoscale Features Grown by MBE on Nonplanar Patterned Si Substrates / Karl D. Hobart, Fritz J. Kub, Henry F. Gray, Mark E. Twigg, Doewon Park and Phillip E. Thompson -- Creating Three-Dimensionally Confined Nanoscale Strained Structures Via Substrate Encoded Size-Reducing Epitaxy and the Enhancement of Critical Thickness for Island Formation / A. Konkar, A. Madhukar and P. Chen -- Self-Assembled Monolayer Films for Nanofabrication / Elizabeth A. Dobisz, F. Keith Perkins, Susan L. Brandow, Jeffrey M. Calvert and Christie R. K. Marrian -- High Rate Dry Etching of GaN, AIN and InN in ECR [actual symbol not reproducible] Plasmas / C. B. Vartuli, S. J. Pearton, C. R. Abernathy, R. J. Shul, S. P. Kilcoyne, M. Hagerott Crawford, A. J. Howard and J. E. Parmeter --
• Nanoscale Structures by Laser Direct Writing in Silicon / H. Dirac, M. Mullenborn and J. W. Petersen -- Nanolithography Developed through Electron Beam Induced Surface Reaction / S. Matsui, Y. Ochiai, M. Baba, J. Fujita, H. Watanabe, S. Manako, Y. Ohnishi, K. Ogai, Y. Kimura and R. Shimizu -- Atomic Diffusion and Strain Measurement on Si Grating Structures by X-ray Diffraction / So Tanaka, Christopher C. Umbach, Qun Shen and Jack M. Blakely -- Lateral Diffusion Limitations of InGaAs/GaAs for Nanostructure Fabrication / Gregory F. Redinbo and Harold G. Craighead -- Manufacture of Submicron Light-Emitting Porous Silicon Areas for Miniature LEDs / S. P. Duttagupta, C. Peng, L. Tsybeskov and P. M. Fauchet -- TiO[subscript 2] Nanophases Formed Using the Sol-Gel Technique / T. Lopez, R. Gomez, J. L. Boldu, E. Munoz, Bokhimi and O. Novaro -- Microstructure of Agglomerates of Nanometer Particles / Alfred P. Weber, James D. Thorne and Sheldon K. Friedlander --
• Surface Structure of a Liquid Perfluoropolyether Examined by Reactive Ion/Surface Scattering / T. Pradeep, S. A. Miller, H. W. Rohrs, B. Feng and R. G. Cooks -- Laser Beam Lithography of Metal Oxide Electrodes for PZT Memory Applications / Jarrod L. Norton, Said A. Mansour, G. L. Liedl, Arden L. Bement, Jr., Elliott B. Slamovich and C. Venkatraman -- Formation of Sub-100 nm Ge Wires on Si by E-Beam Evaporation/Lithography / C. Deng, J. C. Wu, C. J. Barbero, T. W. Sigmon and M. N. Wybourne -- Scanning Tunneling Spectroscopy of Photoexcitations on a Nanosecond Time-Scale / Todd G. Ruskell, Dong Chen and Dror Sarid -- Effects of Gallium Arsenide Passivation on Scanning Tunneling Microscope Excited Luminescence / E. E. Reuter, S. Q. Gu, P. W. Bohn, J. F. Dorsten, G. C. Abeln, J. W. Lyding and S. G. Bishop -- Atomic Force Microscope-Based Lithography of Titanium / A. E. Gordon, D. D. Litfin, M. S. Hagedorn, J. Chen, R. T. Fayfield and T. K. Higman --
• Fabrication of Semiconductor Nanostructures with an Atomic Force Microscope / E. S. Snow and P. M. Campbell -- Direct Nanoscale Patterning by Atomic Manipulation / Craig T. Salling -- SPM-Based Lithography for Electronics Device Fabrication: New Strategies and Directions / J. A. Dagata -- Does 0.1 Micron = Mach 1? / R. Fabian Pease -- The Limits of Patterning In X-ray Lithography / F. Cerrina -- Probing the Limits of Silicon-Based Nanoelectronics / S. J. Wind, Y. Taur, Y. Mii, D. J. Frank, H.-S. Wong, D. A. Buchanan, S. A. Rishton, J. J. Bucchignano, Y. Lii and K. A. Jenkins -- Silicon Nanofabrication and Chemical Modification by UHV-STM / J. W. Lyding, T.-C. Shen, G. C. Abein, C. Wang, E. T. Foley and J. R. Tucker.

ISBN

1558992839 (hardcover : alk. paper)

LCCN

95038929

OCLC

• 33166402
• ocm33166402

Owning Institutions

Columbia University Libraries