Research Catalog

Title

Advances in rapid thermal and integrated processing / edited by Fred Roozeboom.

Publication

Dordrecht ; Boston : Kluwer Academic Publishers, [1996], ©1996.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Roozeboom, Fred.
• North Atlantic Treaty Organization. Scientific Affairs Division.
• NATO Advanced Study Institute on Advances in Rapid Thermal and Integrated Processing (1995 : Acquafredda di Maratea, Italy)

Description

xii, 565 pages : illustrations; 25 cm.

Series Statement

NATO ASI series: Series E, Applied sciences ; vol. 318

Uniform Title

NATO ASI series. Series E, Applied sciences ; no. 318.

Subject

Rapid thermal processing > Congresses

Note

• "Published in cooperation with NATO Scientific Affairs Division."
• "Proceedings of the NATO Advanced Study Institute on Advances in Rapid Thermal and Integrated Precessing, Acquafredda di Maratea, Italy, July 3-14, 1995"--T.p. verso.

Bibliography (note)

• Includes bibliographical references and index.

Contents

• Ch. 1. Introduction: history and perspectives of Rapid Thermal Processing / F. Roozeboom -- Ch. 2. The thermal radiative properties of semiconductors / P. J. Timans -- Ch. 3. Wafer temperature measurement in RTP / C. Schietinger -- Ch. 4. Wafer emissivity in RTP / C. Schietinger -- Ch. 5. Temperature and process control in Rapid Thermal Processing / J.-M. Dilhac -- Ch. 6. Single-wafer process integration and process control techniques / M. M. Moslehi, Y. J. Lee, C. Schaper, T. Omstead, L. Velo, A. Kermani and C. Davis -- Ch. 7. Rapid Thermal O[subscript 2]-oxidation and N[subscript 2]O-oxynitridation / M. L. Green -- Ch. 8. Integrated pre-gate dielectric cleaning and surface preparation / Y. Ma and M. L. Green -- Ch. 9. Dielectric photoformation on Si and SiGe / I. W. Boyd -- Ch. 10. Modeling strategies for Rapid Thermal Processing: finite element and Monte Carlo methods / K. F. Jensen, T. P. Merchant, J. V. Cole, J. P. Hebb, K. L. Knutson and T. G. Mihopoulos --
• Ch. 11. Modeling approaches for Rapid Thermal Chemical Vapor Deposition: combining transport phenomena with chemical kinetics / K. F. Jensen, H. Simka, T. G. Mihopoulos, P. Futerko and M. Hierlemann -- Ch. 12. Silicidation and metallization issues using Rapid Thermal Processing / K. Maex -- Ch. 13. Rapid Thermal Multiprocessing for a programmable factory for manufacturing of ICs / K. C. Saraswat -- Ch. 14. RTCVD integrated processing for photovoltaic application / E. Conrad, P. Muller and A. Kermani -- Ch. 15. Equipment design, cluster tools and scale-up issues / L. Deutschmann and F. Glowacki -- Ch. 16. Rapid Thermal Chemical Vapor Deposition of epitaxial Si and SiGe / W. B. de Boer -- Ch. 17. The evolving role of Rapid Thermal Processing for deep submicron devices / B. Lojek -- Ch. 18. Rapid Thermal Processing of contacts and buffer layers for compound semiconductor device technology / T. Feng, A. Christou, D. Girginoudi and Z. Hatzopoulos --
• Ch. 19. Rapid Thermal Processing of magnetic thin films for data storage devices / F. Roozeboom -- Appendix: List of ASI participants.

ISBN

0792340116 (acid-free paper)

LCCN

96013321

OCLC

• 34412525
• ocm34412525

Owning Institutions

Columbia University Libraries