Research Catalog
Advances in rapid thermal and integrated processing
- Title
- Advances in rapid thermal and integrated processing / edited by Fred Roozeboom.
- Publication
- Dordrecht ; Boston : Kluwer Academic Publishers, [1996], ©1996.
Items in the Library & Off-site
Filter by
1 Item
Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | TK7871.85 A355 1996 | Off-site |
Holdings
Details
- Additional Authors
- Description
- xii, 565 pages : illustrations; 25 cm.
- Series Statement
- NATO ASI series: Series E, Applied sciences ; vol. 318
- Uniform Title
- NATO ASI series. Series E, Applied sciences ; no. 318.
- Subject
- Rapid thermal processing > Congresses
- Note
- "Published in cooperation with NATO Scientific Affairs Division."
- "Proceedings of the NATO Advanced Study Institute on Advances in Rapid Thermal and Integrated Precessing, Acquafredda di Maratea, Italy, July 3-14, 1995"--T.p. verso.
- Bibliography (note)
- Includes bibliographical references and index.
- Contents
- Ch. 1. Introduction: history and perspectives of Rapid Thermal Processing / F. Roozeboom -- Ch. 2. The thermal radiative properties of semiconductors / P. J. Timans -- Ch. 3. Wafer temperature measurement in RTP / C. Schietinger -- Ch. 4. Wafer emissivity in RTP / C. Schietinger -- Ch. 5. Temperature and process control in Rapid Thermal Processing / J.-M. Dilhac -- Ch. 6. Single-wafer process integration and process control techniques / M. M. Moslehi, Y. J. Lee, C. Schaper, T. Omstead, L. Velo, A. Kermani and C. Davis -- Ch. 7. Rapid Thermal O[subscript 2]-oxidation and N[subscript 2]O-oxynitridation / M. L. Green -- Ch. 8. Integrated pre-gate dielectric cleaning and surface preparation / Y. Ma and M. L. Green -- Ch. 9. Dielectric photoformation on Si and SiGe / I. W. Boyd -- Ch. 10. Modeling strategies for Rapid Thermal Processing: finite element and Monte Carlo methods / K. F. Jensen, T. P. Merchant, J. V. Cole, J. P. Hebb, K. L. Knutson and T. G. Mihopoulos --
- Ch. 11. Modeling approaches for Rapid Thermal Chemical Vapor Deposition: combining transport phenomena with chemical kinetics / K. F. Jensen, H. Simka, T. G. Mihopoulos, P. Futerko and M. Hierlemann -- Ch. 12. Silicidation and metallization issues using Rapid Thermal Processing / K. Maex -- Ch. 13. Rapid Thermal Multiprocessing for a programmable factory for manufacturing of ICs / K. C. Saraswat -- Ch. 14. RTCVD integrated processing for photovoltaic application / E. Conrad, P. Muller and A. Kermani -- Ch. 15. Equipment design, cluster tools and scale-up issues / L. Deutschmann and F. Glowacki -- Ch. 16. Rapid Thermal Chemical Vapor Deposition of epitaxial Si and SiGe / W. B. de Boer -- Ch. 17. The evolving role of Rapid Thermal Processing for deep submicron devices / B. Lojek -- Ch. 18. Rapid Thermal Processing of contacts and buffer layers for compound semiconductor device technology / T. Feng, A. Christou, D. Girginoudi and Z. Hatzopoulos --
- Ch. 19. Rapid Thermal Processing of magnetic thin films for data storage devices / F. Roozeboom -- Appendix: List of ASI participants.
- ISBN
- 0792340116 (acid-free paper)
- LCCN
- 96013321
- OCLC
- 34412525
- ocm34412525
- Owning Institutions
- Columbia University Libraries