Research Catalog

Title

High density plasma sources : design, physics, and performance / edited by Oleg A. Popov.

Publication

Park Ridge, N.J. : Noyes Publications, [1995], ©1995.

Items in the Library & Off-site

Holdings

Details

Additional Authors

Popov, Oleg A.

Description

xx, 445 pages : illustrations; 25 cm.

Summary

• This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book.
• This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.

Series Statement

Materials science and process technology series

Uniform Title

Materials science and process technology series.

Subjects

• Plasma generators
• Plasma density
• High temperature plasmas

Bibliography (note)

• Includes bibliographical references and index.

Contents

1. Helicon Plasma Sources / Francis F. Chen -- 2. Planar Inductive Sources / John C. Forster and John H. Keller -- 3. Electrostatically-Shielded Inductively-Coupled RF Plasma Sources / Wayne L. Johnson -- 4. Very High Frequency Capacitive Plasma Sources / Michael J. Colgan and M. Meyyappan -- 5. Surface Wave Plasma Sources / Michel Moisan, Joelle Margot and Zenon Zakrzewski -- 6. Microwave Plasma Disk Processing Machines / Jes Asmussen -- 7. Electron Cyclotron Resonance Plasma Sources / James E. Stevens -- 8. Distributed ECR Plasma Sources / Jacques Pelletier.

ISBN

0815513771

LCCN

95004918

OCLC

ocm32666280

Owning Institutions

Columbia University Libraries