Research Catalog

Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California

Title
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Publication
Bellingham, Wash., USA : SPIE, [1996], ©1996.

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Details

Additional Authors
  • Jones, Susan K.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • SAMATECH.
Description
xiii, 802 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 2725
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2725.
Former Title
Integrated circuit metrology, inspection, and process control.
Subjects
Note
  • Previous volumes entitled: Integrated circuit metrology, inspection and process control.
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819421014
LCCN
95072314
OCLC
ocm35193019
Owning Institutions
Columbia University Libraries