Research Catalog
Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan
- Title
- Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
- Publication
- Bellingham, Wash. : SPIE, [1965], ©1965.
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Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | TK7874 .P46 1996g | Off-site |
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Details
- Additional Authors
- Description
- xiii, 530 pages : illustrations; 28 cm.
- Series Statement
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 2793
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2793.
- Subject
- Note
- "This volume contains the invited and contributed papers presented at Photomask Japan '96, held at the Kanagawa Science Park in Kawasaki, Japan, April 18-19, 1996"--Introduction.
- Bibliography (note)
- Includes bibliographic references and author index.
- ISBN
- 0819421790
- LCCN
- 96067849
- OCLC
- ocm35514342
- Owning Institutions
- Columbia University Libraries