Research Catalog

Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan

Title
Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
Publication
Bellingham, Wash. : SPIE, [1965], ©1965.

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Details

Additional Authors
  • Yoshihara, Hideo.
  • BACUS (Technical group)
  • Society of Photo-optical Instrumentation Engineers. Japan Chapter.
  • Photomask Japan Symposium (1996 : Kawasaki-shi, Japan)
Description
xiii, 530 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 2793
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2793.
Subject
  • Integrated circuits > Masks > Congresses
  • X-ray lithography > Congresses
  • Microlithography > Congresses
Note
  • "This volume contains the invited and contributed papers presented at Photomask Japan '96, held at the Kanagawa Science Park in Kawasaki, Japan, April 18-19, 1996"--Introduction.
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819421790
LCCN
96067849
OCLC
ocm35514342
Owning Institutions
Columbia University Libraries