Research Catalog

Title

Excimer lasers, optics, and applications : 12-13 February, 1997, San Jose, California / Harry Shields, Peter E. Dyer, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.

Publication

Bellingham, Washington : SPIE, [1997], ©1997.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Shields, Harry.
• Dyer, Peter E.
• Society of Photo-optical Instrumentation Engineers.

Description

vii, 160 pages : illustrations; 28 cm.

Series Statement

Proceedings / SPIE--the International Society for Optical Engineering ; v. 2992

Uniform Title

Proceedings of SPIE--the International Society for Optical Engineering ; v. 2992.

Subject

• Excimer lasers > Congresses

Bibliography (note)

• Includes bibliographical references and author index.

Contents

• Excimer lasers of material ablation cross the 1.5 kHz mark / R. Patzel, U. Stamm and I. Bragin [et al.] -- Small excimers opening up new industrial applications / G. Ogura and R. Andrew -- Performance characteristics of a high-energy, high-pulse repetition frequency krypton fluoride laser / T. A. Watson, R. Ujazdowski and P. P. Das -- Coaxial, cylindrical, and planar UV excilamps pumped by glow or barrier discharge / V. F. Tarasenko, M. I. Lomaev and A. N. Panchenko [et al.] -- Optimization of 200-W excimer laser for TFT annealing / V. Pfeufer, F. Voss and B. Becker-de Mos [et al.] -- High-average-power picosecond-pulse excimer laser system for x-ray generation / M. F. Powers and H. Shields -- UV and gas interactions in an enclosed 193-nm excimer laser beamline / D. J. Elliot, J. C. Camp and W. C. Harlow [et al.] -- Improved off-axis pulsed laser deposition method / N. Inoue, T. Ozaki and T. Monnaka [et al.] --
• Optical characterization of binary, tertiary, and quaternary II-VI semiconductor thin films prepared by pulsed excimer laser deposition / L. R. Matthews, R. L. Parkhill and E. T. Knobbe -- Surface texturing of aluminum alloy 2024 via excimer laser irradiation / R. L. Parkhill and E. T. Knobbe -- Processing applications with the 157-nm fluorine excimer laser / P. R. Herman, K. Beckley and B. Jackson [et al.] -- Excimer ablation lithography (EAL) for TFT-LCD / K. Suzuki, M. Matsuda and T. Ogino [et al.] -- Excimer laser machining of advanced materials / H. K. Tonshoff, F. von Alvensleben and P. B. Heekenjann [et al.] -- Morphological surface change of elastomers by excimer laser ablation / A. Yabe, H. Niino and S. Ono [et al.] -- Polyurethane resins as resist materials for excimer ablation lithography (EAL) / N. Hayashi, K. Suzuki and M. Matsuda [et al.] --
• Photopolymers designed for high-resolution laser ablation at a specific irradiation wavelength / T. K. Lippert, L. S. Bennett and T. Kunz [et al.] -- Excimer-laser-irradiated phase masks for grating formation / R. J. Farley, P. E. Dyer and R. Giedl -- General machining concept for producing micro-optics with high-power UV lasers / H. K. Tonshoff, L. Overmeyer and A. Ostendorf [et al.].

ISBN

081942403X

OCLC

ocm36699136

Owning Institutions

Columbia University Libraries