Research Catalog

Title

Plasma processing of semiconductors / edited by P.F. Williams.

Publication

Boston : Kluwer, 1997.

Items in the Library & Off-site

Holdings

Details

Additional Authors

Williams, P. F. (P. Frazer)

Description

x, 613 pages : illustrations; 25 cm.

Series Statement

NATO ASI series. Series E., Applied sciences ; vol. 336

Uniform Title

NATO ASI series. Series E, Applied sciences ; no. 336.

Subjects

• Plasma chemistry > Industrial applications
• Plasma etching > Industrial applications
• Semiconductors > Etching
• Plasma engineering

Note

• Includes index.

Contents

• Introduction to Plasma Etching / T. D. Mantei -- Plasma Chemistry, Basic Processes and PECVD / D. L. Flamm -- The Role of Ions in Reactive Ion Etching with Low Density Plasmas / J. W. Coburn -- SiO[subscript 2] Etching in High-Density Plasmas: Differences with Low-Density Plasmas / G. S. Oehrlein -- Introduction to Plasma Enhanced Chemical Vapor Deposition / T. S. Cale, G. B. Raupp and B. R. Rogers [et al.] -- Topography Evolution During Semiconductor Processing / T. S. Cale, V. Mahadev and Z. Tang [et al.] -- Deposition of Amorphous Silicon / J. Perrin -- High Density Sources for Plasma Etching / T. D. Mantei -- Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications / H. Oechsner -- The Transition from Capacitive to Inductive to Wave Sustained Discharges / R. W. Boswell, A. Ellingboe and A. Degeling [et al.] -- Physics of Surface-Wave Discharges / J. Margot and M. Moisan --
• Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas / J. W. Coburn -- Plasma-Surface Interactions / R. d'Agostino -- Cl[subscript 2] Plasma-Si Surface Interactions in Plasma Etching / V. M. Donnelly, N. Layadi and J. T. C. Lee [et al.] -- Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing / C. K. Birdsall -- Fluid and Hybrid Models of Non Equilibrium Discharges / J.-P. Boeuf and A. Merad -- Optical Diagnostics of Processing Plasmas / P. F. Williams -- Optical Diagnostics of Plasmas: A Tool for Process Control / N. Sadeghi, J. Derouard and J.-P. Booth -- Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas / G. M. W. Kroesen -- Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials / J. A. Woollam -- Mass Spectrometry of Reactive Plasmas / J. Perrin --
• Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications / R. W. Boswell, A. Durandet and C. Charles [et al.] -- Remote Plasma Processing / G. S. Oehrlein -- Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer / J. Margot, M. Chaker and M. Moisan [et al.] -- Dusty Plasmas: Fundamental Aspects and Industrial Applications / G. M. W. Kroesen -- Low Energy Plasma Beams for Semiconductor Technology / H. Oechsner -- Process Control Concepts / S. Watts Butler -- Issues and Solutions for Applying Process Control to Semiconductor Manufacturing / S. Watts Butler.

ISBN

0792345673 (acid-free paper)

LCCN

97016609

OCLC

ocm36746516

Owning Institutions

Columbia University Libraries