Research Catalog

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Title
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
Publication
Bellingham, Washington : SPIE, [1997], ©1997.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
Request for On-site UseRequest Scan
Not available - Please for assistance.
TextRequest in advance TK7878 .P46 1997gOff-site

Holdings

Details

Additional Authors
  • Aizaki, Naoaki.
  • BACUS (Technical group)
  • Ōyō Butsuri Gakkai.
  • Society of Photo-optical Instrumentation Engineers. Japan Chapter.
  • Photomask Japan Symposium.
Description
xiii, 504 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 3096
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3096.
Subjects
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819425168
OCLC
ocm37589239
Owning Institutions
Columbia University Libraries