Research Catalog

Title

Charged particle optics III : 27-28 July 1997, San Diego, California / Eric Munro, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering.

Publication

Bellingham, Wash., USA : SPIE, [1997], ©1997.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Munro, Eric.
• Society of Photo-optical Instrumentation Engineers.

Description

vii, 266 pages : illustrations; 28 cm.

Series Statement

SPIE proceedings series ; v. 3155

Uniform Title

Proceedings of SPIE--the International Society for Optical Engineering ; v. 3155.

Alternative Title

• Charged particle optics 3
• Charged particle optics three

Subjects

• Electron optics > Industrial applications > Congresses
• Electron optics > Congresses

Bibliography (note)

• Includes bibliographical references and index.

Contents

• Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL) / W. K. Waskiewicz and J. A. Liddle -- Emission models for thermionic cathodes / D. C. Carpenter and J. Simkin -- Design of a magnification and rotation unit with predesign tool POCAD / M. A. van der Stam, B. Mertens and P. Kruit -- In-lens deflectors for an LVSEM magnetic immersion objective lens / Y. Zhao and A. Khursheed -- Analysis of off-axis shaped beam systems for high-throughput electron-beam lithography / X. Zhu, H. Liu and E. Munro [et al.] -- Simulation of microstrip deflectors for field emission display / Z. Cui -- Optimization of electrostatic lens systems: fast approximate calculation of the imaging properties of einzel lenses / R. Degenhardt -- Nature of distortions of the surface pattern produced by precise electron-beam processing of insulators / A. M. Filachev, B. I. Fouks and D. E. Greenfeld --
• Electrostatic deflection aberrations studied with ray tracing: a surprising and simple solution proposed / M. Retsky -- Mesh refinement for finite-element field computations in electron optics / A. Khursheed -- Improved 3D boundary charge method for high-accuracy electric field calculation / H. Murata, T. Ohye and H. Shimoyama -- Matrizant method for an optimal synthesis of nonlinear magnetic and electrostatic focusing systems for a given beam current / A. D. Dymnikov and G. Martinez -- Discretization of partial differential equations in irregular meshes / E. K. Kasper -- Compact electrostatic lithography column for nanoscale exposure / T. Chisholm, H. Liu and E. Munro [et al.] -- Novel resist and exposure strategy for high-resolution electron-beam lithography / W. Daumann, R. M. Bertenburg and C. van den Berg [et al.] -- Testing printed circuit boards and MCMs with electron beams / A. B. El-Kareh --
• Miniature scanning electron microscope design based upon the use of permanent magnets / A. Khursheed, J. T. L. Thong and J. C. Phang [et al.] -- Arbitrary order maps, remainder terms, and long-term stability in particle accelerators / M. Berz and K. Makino -- Computer analysis of imaging energy filters / J. Rouse, E. Munro and K. Tsuno -- Influence of the rod diameter of electrostatic quadrupole lenses on the axial field and on the minimum spot size in nonlinear microprobes / A. H. Azbaid, A. D. Dymnikov and G. Martinez -- Spherical aberration correction of a focused ion beam with space charge / J. Orloff -- Arbitrary order aberrations for elements characterized by measured fields / K. Makino and M. Berz -- Influence of perturbations at distortion and tolerances with regard to their corrections in ion-projection systems / S. N. Jatchmenev and A. A. Chinenov --
• Modern numerical techniques and software for photo- and thermoemission electron optical systems computer-aided design / M. A. Monastyrski, S. V. Andreev and I. S. Gaidukova [et al.] -- Some models and codes in imaging and high-current electron optics / V. Ya. Ivanov.

ISBN

081942577X

OCLC

ocm37826273

Owning Institutions

Columbia University Libraries