Research Catalog

Microlithography fundamentals in semiconductor devices and fabrication technology

Title
Microlithography fundamentals in semiconductor devices and fabrication technology / Saburo Nonogaki, Takumi Ueno, Toshio Ito.
Author
Nonogaki, Saburo, 1930-
Publication
New York : Marcel Dekker, [1998], ©1998.

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Details

Additional Authors
  • Ueno, Takumi, 1951-
  • Ito, Toshio, 1952-
Description
v, 327 pages : illustrations; 24 cm
Summary
Ranging from the basic principles to the forefront of microlithography, this unique volume explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing.
Subject
  • Semiconductors > Design and construction
  • Microlithography > Industrial applications
  • Manufacturing processes
  • Photoresists
Bibliography (note)
  • Includes bibliographical references and index.
Contents
1. Introduction -- 2. Exposure Systems in Photolithography -- 3. Optical Pattern Transfer -- 4. Chemistry of Photoresist Materials -- 5. Practical Processes in Microlithography -- 6. X-ray Lithography -- 7. Electron Beam Lithography -- 8. Variations in the Microlithographic Process -- App. Two-dimensional Diffraction.
ISBN
0824799518 (alk. paper)
LCCN
98004222
OCLC
  • 38948131
  • ocm38948131
Owning Institutions
Columbia University Libraries