Research Catalog
Microlithography fundamentals in semiconductor devices and fabrication technology
- Title
- Microlithography fundamentals in semiconductor devices and fabrication technology / Saburo Nonogaki, Takumi Ueno, Toshio Ito.
- Author
- Nonogaki, Saburo, 1930-
- Publication
- New York : Marcel Dekker, [1998], ©1998.
Items in the Library & Off-site
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1 Item
Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | TK7871.85 .N66 1998 | Off-site |
Holdings
Details
- Additional Authors
- Description
- v, 327 pages : illustrations; 24 cm
- Summary
- Ranging from the basic principles to the forefront of microlithography, this unique volume explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing.
- Subject
- Bibliography (note)
- Includes bibliographical references and index.
- Contents
- 1. Introduction -- 2. Exposure Systems in Photolithography -- 3. Optical Pattern Transfer -- 4. Chemistry of Photoresist Materials -- 5. Practical Processes in Microlithography -- 6. X-ray Lithography -- 7. Electron Beam Lithography -- 8. Variations in the Microlithographic Process -- App. Two-dimensional Diffraction.
- ISBN
- 0824799518 (alk. paper)
- LCCN
- 98004222
- OCLC
- 38948131
- ocm38948131
- Owning Institutions
- Columbia University Libraries