Research Catalog

Title

Micro- and nanopatterning polymers / Hiroshi Ito, editor [and others].

Publication

Washington, DC : American Chemical Society ; [New York] : Distributed by Oxford University Press, [1998], ©1998.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Ito, Hiroshi.
• American Chemical Society. Division of Polymeric Materials: Science and Engineering.
• American Chemical Society. Meeting (214th : 1997 : Las Vegas, Nev.)

Description

xii, 386 pages : illustrations; 24 cm.

Series Statement

ACS symposium series, 0097-6156 ; 706

Uniform Title

ACS symposium series ; 706.

Subjects

• Photoresists > Materials
• Polymeric composites
• Microelectronics > Materials

Note

• "Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 214th ACS National Meeting, Las Vegas, Nevada, September 7-11, 1997."

Bibliography (note)

• Includes bibliographical references and indexes.

Contents

• 1. Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison, Miri Park and Paul M. Chaikin [et al.] -- 2. Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz, Thomas Herzog and Stefan Mossmer [et al.] -- 3. Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman, R. W. Vest and J. L. Snover [et al.] -- 4. Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino and Akira Yabe -- 5. An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill and Sharon L. Blair -- 6. Molding of Polymeric Microstructures / T. Hanemann, V. Piotter and R. Ruprecht [et al.] --
• 7. Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht, P. Falcigno and N. Munzel [et al.] -- 8. Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang, Kim Y. Lee and Rao Bantu [et al.] -- 9. Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani, Hiroshi Yoshino and Shuichi Hashimoto [et al.] -- 10. Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada, Masahito Kushida and Kyoichi Saito [et al.] -- 11. Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor, Paul M. Dentinger and Steven J. Rhyner [et al.] -- 12. The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay, M. King and A. Orellana [et al.] --
• 13. Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura, Koji Arimitsu and Soh Noguchi [et al.] -- 14. Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu, Jeffrey D. Byers and Ti Cao [et al.] -- 15. 193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan, A. Timko and R. Hutton [et al.] -- 16. Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito, Norbert Seehof and Rikiya Sato [et al.] -- 17. Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen, Juliann Opitz and Carl E. Larson [et al.] --
• 18. Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba, Daisuke Takahashi and Kohji Haga [et al.] -- 19. Calixarene Resists for Nanolithography / Yoshitake Ohnishi, Naoko Wamme and Jun-ichi Fujita -- 20. Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard, Dario Pasini and Jean M. J. Frechet [et al.] -- 21. Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki -- 22. The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams, Wang Yueh and Pavlos Tsiartas [et al.] -- 23. Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai, Mitsuho Masuda and Masahiro Tsunooka [et al.] --
• 24. Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi, Hiroshi Ito and Phil Brock [et al.] -- 25. Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo and A. Katsuyama -- 26. Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis, S. Boyatzis and I. Raptis [et al.] -- 27. Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno, Y. Okabe and T. Miwa [et al.].

ISBN

0841235813

LCCN

98025955

OCLC

• 39257282
• ocm39257282

Owning Institutions

Columbia University Libraries