Research Catalog

1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA

Title
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA / Moritaka Nakamura, Thuy Dao, and Terence Hook, editors ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japanese Society of Applied Physics.
Author
International Symposium on Plasma Process-Induced Damage (3rd : 1998 : Honolulu, Hawaii)
Publication
Sunnyvale, California : Northern California Chapter of the American Vacuum Society, [1998], ©1998.

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Details

Additional Authors
  • Nakamura, Moritaka.
  • Dao, Thuy.
  • Hook, Terence.
  • IEEE Electron Devices Society.
  • American Vacuum Society.
  • Ōyō Butsuri Gakkai.
Description
[ix], 236 unnumbered pages : illustrations; 28 cm
Alternative Title
  • P²ID
  • Plasma process-induced damage
Subjects
Note
  • "P²ID"--cover
  • "IEEE Catalog Number 98EX100"--verso of T.p.
Bibliography (note)
  • Includes bibliographical references and author index.
ISBN
  • 0965157725 (softbound edition)
  • 0780342666 (microfiche edition)
LCCN
98065928
OCLC
ocm40187344
Owning Institutions
Columbia University Libraries