Research Catalog

Dusty plasmas : physics, chemistry, and technological impacts in plasma processing

Title
Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule.
Publication
Chichester, England ; New York : Wiley, [1999], ©1999.

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Additional Authors
Bouchoule, André.
Description
viii, 408 pages : illustrations; 24 cm
Subject
  • Plasma engineering
  • Plasma (Ionized gases) > Industrial applications
  • Dusty plasmas
  • Plasma chemistry
  • Plasma-enhanced chemical vapor deposition
Bibliography (note)
  • Includes bibliographical references and indexes.
ISBN
0471973866 (alk. paper)
LCCN
98050683
OCLC
ocm40339717
Owning Institutions
Columbia University Libraries