Research Catalog

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California

Title
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California / Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
Publication
Bellingham, Wash., USA : SPIE, [1998], ©1998.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
Request for On-site UseRequest Scan
How do I pick up this item and when will it be ready?
TextRequest in advance TK7874 .M4376 1998Off-site

Holdings

Details

Additional Authors
  • Singh, Bhanwar.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
Description
xv, 744 pages : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 3332
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3332.
Subjects
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819427772
LCCN
98226775
OCLC
ocm39381603
Owning Institutions
Columbia University Libraries