Research Catalog

Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan

Title
Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics [and others].
Publication
Bellingham, Wash., USA : SPIE, [1999], ©1999.

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Details

Additional Authors
  • Morimoto, Hiraoki.
  • BACUS (Technical group)
  • Ōyō Butsuri Gakkai.
  • Photomask Japan Symposium.
Description
xiii, 628 pages : illustrations (some color); 28 cm.
Series Statement
SPIE proceedings series ; v. 3748
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3748.
Subject
  • Masks (Electronics) > Congresses
  • Integrated circuits > Masks > Congresses
  • X-ray lithography > Congresses
  • Microlithography > Congresses
  • Optoelectronic devices > Design and construction > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
081943230X
OCLC
ocm42467808
Owning Institutions
Columbia University Libraries