Research Catalog

Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California

Title
Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California / Bhanwar Singh, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Publication
Bellingham, Wash., USA : SPIE, [1999], ©1999.

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Holdings

Details

Additional Authors
  • Singh, Bhanwar.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
Description
2 volumes (xv, 1052 pages) : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 3677
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3677.
Subjects
Bibliography (note)
  • Includes bibliographical references and author index.
ISBN
0819431516
OCLC
ocm41792029
Owning Institutions
Columbia University Libraries