Research Catalog

Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California

Title
Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Publication
Bellingham, Washington : SPIE, [1999], ©1999.

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Details

Additional Authors
  • Vladimirsky, Yuli.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
Description
2 volumes (xvii, 864 pages) : illustrations; 28 cm.
Series Statement
Proceedings of SPIE ; v. 3676
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3676.
Subject
  • Lithography, Electron beam > Congresses
  • Microlithography > Industrial applications > Congresses
  • X-ray lithography > Congresses
  • X-rays > Industrial applications > Congresses
  • Masks (Electronics) > Congresses
Bibliography (note)
  • Includes bibliographical references and author index.
ISBN
0819431508
OCLC
ocm41946614
Owning Institutions
Columbia University Libraries