Research Catalog
Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan
- Title
- Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Publication
- Bellingham, Washington : SPIE, [1998], ©1998.
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| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
Not available - Please for assistance. | Text | Request in advance | TK7878 .P56 1998 | Off-site |
Holdings
Details
- Additional Authors
- Description
- xiii, 616 pages : illustrations; 28 cm.
- Series Statement
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 3412
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 3412.
- Subjects
- Bibliography (note)
- Includes bibliographical references and index.
- ISBN
- 0819428647
- LCCN
- 98227293
- OCLC
- ocm40055298
- Owning Institutions
- Columbia University Libraries