Research Catalog

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Title
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California / Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Author
Symposium on Photomask Technology (19th : 1999 : Monterey, Calif.)
Publication
Bellingham, Wash., USA : SPIE, [1999], ©1999.

Items in the Library & Off-site

Filter by

2 Items

StatusVol/DateFormatAccessCall NumberItem Location
v.1TextRequest in advance TK7874 .S9438 1999g v.1Off-site
v.2TextRequest in advance TK7874 .S9438 1999g v.2Off-site

Holdings

Details

Additional Authors
  • Abboud, Frank E.
  • Grenon, Brian J.
  • BACUS (Technical group)
  • Society of Photo-optical Instrumentation Engineers.
Description
2 volumes (xv, 1022 pages) : illustrations (some color); 28 cm.
Series Statement
SPIE proceedings series ; v. 3873
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3873.
Alternative Title
  • Nineteenth Annual Symposium on Photomask Technology
  • Symposium on Photomask Technology
  • Photomask technology
Subject
  • Integrated circuits > Masks > Congresses
  • Microlithography > Congresses
Note
  • Eighteenth conference called: Symposium on Photomask Technology and Management.
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
081943468X
OCLC
  • ocm43381540
  • SCSB-3862096
Owning Institutions
Columbia University Libraries