Research Catalog
Handbook of chemical vapor depostion [i.e. deposition] (CVD) : principles, technology, and applications
- Title
- Handbook of chemical vapor depostion [i.e. deposition] (CVD) : principles, technology, and applications / by Hugh O. Pierson.
- Author
- Pierson, Hugh O.
- Publication
- Norwich, N.Y. : Noyes Publications/William Andrew Pub., [1999], ©1999.
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Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | TS695 .P52 1999 | Off-site |
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Details
- Description
- xxiv, 482 pages : illustrations; 25 cm.
- Summary
- "Since the publication of the first edition of the Handbook of Chemical Vapor Deposition (CVD) in early 1992, the technology has developed at a rapid rate and the number and scope of its applications and their impact of the market have increased considerably. This process is now a key factor in many industries such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters and many others.
- The size of the CVD market today (1999) is estimated to be at least double that of the market seven years ago. This second edition of the Handbook is an update with a considerably expanded and revised scope."--BOOK JACKET.
- Series Statement
- Materials science and process technology series
- Uniform Title
- Materials science and process technology series.
- Alternative Title
- Handbook of chemical vapor deposition
- Subjects
- Note
- Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992.
- Bibliography (note)
- Includes bibliographical references and index.
- Contents
- 1. Introduction and General Considerations -- 2. Fundamentals of Chemical Vapor Deposition -- 3. The Chemistry of CVD -- 4. Metallo-Organic CVD (MOCVD) -- 5. CVD Processes and Equipment -- 6. The CVD of Metals -- 7. The CVD of the Allotropes of Carbon -- 8. The CVD of Non-Metallic Elements -- 9. The CVD of Ceramic Materials: Carbides -- 10. The CVD of Ceramic Materials: Nitrides -- 11. The CVD of Ceramic Materials: Oxides -- 12. The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- 13. CVD in Electronic Applications: Semiconductors -- 14. CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- 15. CVD in Optoelectronic and Ferroelectric Applications -- 16. CVD in Optical Applications -- 17. CVD in Wear- and Corrosion-Resistant Applications -- 18. CVD in Cutting-Tool Applications -- 19. CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide --
- App. Alternative Processes for Thin-Film Deposition and Surface Modification.
- ISBN
- 0815514328
- LCCN
- 99026065
- OCLC
- ocm41090758
- SCSB-3863819
- Owning Institutions
- Columbia University Libraries