Research Catalog
Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA
- Title
- Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Publication
- Bellingham, Washington : SPIE, [2000], ©2000.
Items in the Library & Off-site
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2 Items
| Status | Vol/Date | Format | Access | Call Number | Item Location |
|---|---|---|---|---|---|
| p.1 | Text | Request in advance | TK7874 .A25 2000g p.1 | Off-site | |
| p.2 | Text | Request in advance | TK7874 .A25 2000g p.2 | Off-site |
Holdings
Details
- Additional Authors
- Description
- 2 volumes : illustrations; 28 cm.
- Series Statement
- SPIE proceedings series ; v. 3999
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 3999.
- Subject
- Bibliography (note)
- Includes bibliographic references and author index.
- ISBN
- 0819436178
- OCLC
- ocm44601328
- SCSB-3900061
- Owning Institutions
- Columbia University Libraries