Research Catalog

Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA

Title
Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Publication
Bellingham, Washington : SPIE, [2000], ©2000.

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Details

Additional Authors
  • Dobisz, Elizabeth A. (Elizabeth Ann)
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Description
xv, 900 pages : illustrations; 28 cm.
Series Statement
Proceedings of SPIE ; v. 3997
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3997.
Subjects
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819436151
OCLC
  • ocm44738861
  • SCSB-3927886
Owning Institutions
Columbia University Libraries