Research Catalog

Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan

Title
Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.
Publication
Bellingham, Wash., USA : SPIE, [2000], ©2000.

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Details

Additional Authors
  • Morimoto, Hiraoki.
  • BACUS (Technical group)
  • Society of Photo-optical Instrumentation Engineers.
  • Ōyō Butsuri Gakkai.
  • Seimitsu Kōgakkai.
  • Denki Gakkai (1888)
  • Semiconductor Equipment and Materials International (Japan)
  • Photomask Japan Symposium.
Description
xv, 750 pages : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 4066
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4066.
Alternative Title
  • Photomask and next generation lithography mask technology VII
  • Photomask and x-ray mask technology.
Subjects
Note
  • Earlier proceedings have title: Photomask and X-ray mask technology.
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819437026
OCLC
  • ocm45032912
  • SCSB-3996900
Owning Institutions
Columbia University Libraries