Research Catalog

Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA

Title
Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
Publication
Bellingham, Washington : SPIE, [2001], ©2001.

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Details

Additional Authors
  • Sullivan, Neal T.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Description
xxv, 876 pages : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 4344
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4344.
Subjects
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819440302
OCLC
  • ocm48153013
  • SCSB-4205212
Owning Institutions
Columbia University Libraries