Research Catalog
Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA
- Title
- Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
- Publication
- Bellingham, Washington : SPIE, [2001], ©2001.
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Text | Request in advance | TK7874 .I5554 2001g | Off-site |
Holdings
Details
- Additional Authors
- Description
- xxv, 876 pages : illustrations; 28 cm.
- Series Statement
- SPIE proceedings series ; v. 4344
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 4344.
- Subjects
- Bibliography (note)
- Includes bibliographic references and author index.
- ISBN
- 0819440302
- OCLC
- ocm48153013
- SCSB-4205212
- Owning Institutions
- Columbia University Libraries