Research Catalog

Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan

Title
Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City.
Publication
Bellingham, Wash., USA : SPIE, [2001], ©2001.

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Details

Additional Authors
  • Kawahira, Hiroichi.
  • BACUS (Technical group)
  • Ōyō Butsuri Gakkai.
  • Semiconductor Equipment and Materials International (Japan)
  • Society of Photo-optical Instrumentation Engineers.
  • Photomask Japan Symposium.
Description
xv, 738 pages : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 4409
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4409.
Alternative Title
  • Photomask and next generation lithography mask technology VIII
  • Photomask and x-ray mask technology.
Subject
  • Masks (Electronics) > Congresses
  • Integrated circuits > Masks > Congresses
  • X-ray lithography > Congresses
  • Microlithography > Congresses
  • Optoelectronic devices > Design and construction > Congresses
Note
  • Some earlier proceedings have title: Photomask and X-ray mask technology.
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819441112
OCLC
  • ocm48226699
  • SCSB-4211543
Owning Institutions
Columbia University Libraries